Metric · Lithography & Materials
Source power
The EUV light output at intermediate focus, measured in watts, which together with resist sensitivity determines scanner throughput. Raising it has been the main lever behind EUV productivity gains.
- Also known as
- EUV power
- Type
- Metric
- Domain
- Lithography & Materials, EUV lithography
Notes
Production sources moved from roughly 100 W at first insertion to 500 W and above on later platforms.
Related terms
Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
Where it appears on the Hub
Used on 2 pages of the Hub. In each group, the pages that mention it most come first.
Roles
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