| CXMT | CXMT Hefei | Hefei, China | — | In Productionnot yet evidenced | 17nm DRAM (Memory) | 300mm | 2019 | 12 | 13 | Available | — |
| Nexchip Semiconductor | Hefei fabs (N1 to N3) | Hefei, China | — | In production | 55-150nm (Mature (≥40nm)) | — | — | — | — | Available | — |
| Nexchip Semiconductor | Hefei Phase IV fab | Hefei, China | — | Under construction | 40nm and 28nm (22 to 28nm class) | 300mm | — | — | — | Early access | — |
| Samsung Electronics | Xi'an memory fab (X1/X2) | Xi'an, China | — | In production | Fifth-generation V-NAND (X2 line) (Memory) | — | — | — | — | Available | — |
| SMIC | Lingang 12-inch fab (Shanghai) | Shanghai, China | — | Under constructionEvidence may be out of date | 28nm and above (22 to 28nm class) | 300mm | — | — | — | Early access | — |
| SMIC | SMIC Shanghai (B Line) | Shanghai, China | — | In Productionnot yet evidenced | 14nm (10 to 16nm class) | 300mm | 2019 | 35 | 36 | Available | — |
| SMIC | Tianjin Xiqing 12-inch fab | Tianjin, China | — | AnnouncedEvidence may be out of date | 28-180nm (22 to 28nm class) | 300mm | — | — | — | Early access | — |
| SMIC | Shenzhen 12-inch fab | Shenzhen, China | — | Under constructionEvidence may be out of date | 28nm and above (22 to 28nm class) | 300mm | — | — | — | Early access | — |
| SwaySure Technology | SwaySure Technology | Shenzhen, China | Memory | Under Constructionnot yet evidenced | DRAM fab (Memory) | — | — | — | — | Early access | — |
| TSMC | Fab 16 (Nanjing) | Nanjing, China | — | In production | 16nm (10 to 16nm class) | 300mm | — | — | — | Available | — |
| YMTC | Wuhan Fab 1 | Wuhan, China | — | In productionEvidence may be out of date | 128-layer 3D NAND (Memory) | — | — | — | — | Available | — |
| Bosch | Dresden 300 mm wafer fab | Dresden, Germany | — | In productionEvidence may be out of date | down to 65nm (ASICs, power semiconductors) (Mature (≥40nm)) | 300mm | — | — | — | Available | — |
| European Semiconductor Manufacturing Company | European Semiconductor Manufacturing Company | Dresden, Germany | Foundry | Under constructionEvidence may be out of date | 28/22nm and 16/12nm (10 to 16nm class) | 300mm | 2027 | — | — | Early access | — |
| GlobalFoundries | Fab 1 (Dresden) | Dresden, Germany | — | In production | FDX FD-SOI, feature-rich CMOS, Power BCD (technology class, no node size published) | 300mm | — | — | — | Available | — |
| Infineon Technologies | Smart Power Fab (Dresden Module 4) | Dresden, Germany | — | In production | 300 mm analog/mixed-signal and power technologies (technology class, no node size published) | 300mm | — | — | — | Available | — |
| Intel | Magdeburg fab (planned) | Magdeburg, Germany | — | Announced, stalledEvidence may be out of date | Angstrom-era technology (< 2nm) | — | — | — | — | Early access | — |
| ISMC | ISMC Analog Fab | Mysuru, India | Foundry | Stallednot yet evidenced | Analog fab (technology class, no node size published) | — | — | — | — | Early access | — |
| Tata Electronics | Dholera fab | Dholera, India | — | Under construction | 28-110nm (22 to 28nm class) | 300mm | — | — | — | Early access | — |
| Intel | Fab 34 | Leixlip, Ireland | — | In productionEvidence may be out of date | Intel 4 (4nm class) | — | — | — | — | Available | — |
| Intel | Fab 28 | Kiryat Gat, Israel | — | In productionEvidence may be out of date | Intel 7 (7nm class) | — | — | — | — | Available | — |
| Tower Semiconductor | Migdal HaEmek Fab 2 (200mm) | Migdal HaEmek, Israel | — | In production | 0.18-0.13um (Mature (≥40nm)) | 200mm | — | — | — | Available | — |
| STMicroelectronics | Silicon Carbide Campus (Catania) | Catania, Italy | — | Under constructionEvidence may be out of date | 200 mm SiC (technology class, no node size published) | 200mm | 2026 | — | — | Early access | — |
| Kioxia | Kitakami Fab2 (K2) | Kitakami, Japan | — | In production | 218-layer 3D flash (BiCS FLASH 8th generation) (Memory) | — | — | — | — | Available | — |
| Kioxia | Yokkaichi Fab7 (Y7) | Yokkaichi, Japan | — | In productionEvidence may be out of date | 162-layer 3D flash (BiCS FLASH 6th generation) (Memory) | — | — | — | — | Available | — |
| Micron Technology | Hiroshima fab | Hiroshima, Japan | — | In productionEvidence may be out of date | 1-beta DRAM (volume); 1-gamma EUV planned (Memory) | — | — | — | — | Available | — |
| Rapidus | IIM-1 | Chitose, Japan | — | Under construction | 2nm GAA (2nm class) | — | 2027 | — | — | Early access | — |
| Japan Advanced Semiconductor Manufacturing | JASM Kumamoto (second fab) | Kumamoto, Japan | — | Under construction | 3nm (3nm class) | 300mm | — | — | — | Early access | — |
| Japan Advanced Semiconductor Manufacturing | JASM Kumamoto | Kumamoto, Japan | — | In Productionnot yet evidenced | 22/28nm and 12/16nm (10 to 16nm class) | 300mm | 2024 | 15 | 15 | Available | Japan METI grant |
| Infineon Technologies | Kulim 3 | Kulim, Malaysia | — | In productionEvidence may be out of date | 200 mm SiC (with GaN epitaxy) (technology class, no node size published) | 200mm | — | — | — | Available | — |
| GlobalFoundries | Singapore (Woodlands) | Singapore, Singapore | — | In production | Power BCD, RF-SOI, SiGe, silicon photonics, feature-rich CMOS (technology class, no node size published) | 300mm | — | — | — | Available | — |
| Micron Technology | Singapore NAND fab | Singapore, Singapore | — | In production | 232-layer NAND (Memory) | — | — | — | — | Available | — |
| UMC | Fab 12i P3 | Singapore, Singapore | — | Under construction | 22/28nm (22 to 28nm class) | 300mm | 2026 | — | — | Early access | — |
| VSMC | VSMC Singapore 300mm fab | Tampines, Singapore | — | Under construction | 130-40nm (Mature (≥40nm)) | 300mm | 2027 | — | — | Early access | — |
| Samsung Electronics | Pyeongtaek Line 2 | Pyeongtaek, South Korea | — | In production | 1z DRAM (EUV); V-NAND; foundry EUV 5nm and below (Memory) | 300mm | — | — | — | Available | — |
| Samsung Electronics | S3 Line | Hwaseong, South Korea | — | In Productionnot yet evidenced | 3nm (3nm class) | 300mm | 2022 | 30 | 32 | Constrained | — |
| SK hynix | M16 | Icheon, South Korea | — | In Productionnot yet evidenced | 1anm DRAM (Memory) | 300mm | 2021 | 15 | 17 | Constrained | — |
| SK hynix | M15X | Cheongju, South Korea | — | Under construction | 1b DRAM (for HBM4) (Memory) | — | — | — | — | Early access | — |
| Yongin Semiconductor Cluster | Yongin Semiconductor Cluster | Yongin, South Korea | Government & National Programs | Under Constructionnot yet evidenced | National cluster (Mature (≥40nm)) | — | — | — | — | Early access | — |
| Nanya Technology | Fab 5A (Taishan) | New Taipei, Taiwan | — | Under construction | 10nm-class DRAM (EUV) (Memory) | 300mm | 2028 | — | — | Early access | — |
| TSMC | Fab 20 (Baoshan) | Hsinchu, Taiwan | — | In production | N2 (2nm class) | 300mm | — | — | — | Available | — |
| TSMC | Fab 18 | Tainan, Taiwan | — | In productionEvidence may be out of date | 3nm (3nm class) | 300mm | 2021 | 100 | 110 | Constrained | — |
| TSMC | Fab 12 (12A/12B) | Hsinchu, Taiwan | — | In production | 28nm (volume); 22nm (R&D) (22 to 28nm class) | 300mm | — | — | — | Available | — |
| TSMC | Fab 14 (14A/14B) | Tainan, Taiwan | — | In production | 20nm (Phase 5) (22 to 28nm class) | 300mm | — | — | — | Available | — |
| TSMC | Fab 15 (15A/15B) | Taichung, Taiwan | — | In production | 40nm and 28nm (22 to 28nm class) | 300mm | — | — | — | Available | — |
| TSMC | Fab 22 (Kaohsiung) | Kaohsiung, Taiwan | — | In production | N2 (2nm family, A16 in later phases) (2nm class) | 300mm | — | — | — | Available | — |
| UMC | Fab 12A | Tainan, Taiwan | — | In Productionnot yet evidenced | 14nm (10 to 16nm class) | 300mm | 2003 | 40 | 40 | Available | — |
| Winbond Electronics | Kaohsiung fab | Kaohsiung, Taiwan | — | In productionEvidence may be out of date | 25nm specialty DRAM (Memory) | 300mm | — | — | — | Available | — |
| HIT-Cip | HIT-Cip | Ankara, Turkey | Government & National Programs | Announcednot yet evidenced | National incentive (Mature (≥40nm)) | — | — | — | — | Early access | — |
| UK Semiconductor Institute | UK Semiconductor Institute | United Kingdom | Government & National Programs | Announcednot yet evidenced | National institute (Mature (≥40nm)) | — | — | — | — | Early access | — |
| GlobalFoundries | Fab 8 | Malta, NY, United States | — | In Productionnot yet evidenced | 12nm (10 to 16nm class) | 300mm | 2012 | 25 | 25 | Available | US CHIPS Act |
| Intel | Fab 52 | Chandler, United States | — | In production | Intel 18A (2nm class) | — | — | — | — | Available | — |
| Intel | Ohio One | New Albany, United States | — | Under Constructionnot yet evidenced | 18A (2nm class) | 300mm | 2030 | — | — | Early access | US CHIPS Act |
| Intel Foundry | Fab 42 | Chandler, United States | — | In Productionnot yet evidenced | Intel 18A (modernization planned) (2nm class) | 300mm | 2020 | 15 | 20 | Constrained | US CHIPS Act |
| Micron | Boise ID1 DRAM Fab | Boise, United States | — | Under construction | 1beta DRAM (Memory) | 300mm | — | 10 | 12 | Early access | US CHIPS Act |
| NSTC EUV Accelerator | NSTC EUV Accelerator | Albany, United States | Research & Institutes | Under Constructionnot yet evidenced | Pilot line (< 2nm) | — | — | — | — | Early access | — |
| Samsung Electronics | Taylor Fab | Taylor, TX, United States | — | Under Constructionnot yet evidenced | 2nm (2nm class) | 300mm | 2027 | — | — | Early access | US CHIPS Act |
| Samsung Austin Semiconductor | S2 Line (Austin) | Austin, United States | — | In production | 65-14nm (10 to 16nm class) | 300mm | — | — | — | Available | — |
| Texas Instruments | SM1 (Sherman) | Sherman, United States | — | In production | 300 mm analog and embedded processing (technology class, no node size published) | 300mm | — | — | — | Available | — |
| Texas Instruments | LFAB1 (Lehi) | Lehi, United States | — | In productionEvidence may be out of date | 65nm and 45nm (Mature (≥40nm)) | 300mm | — | — | — | Available | — |
| TSMC Arizona | Arizona Fab (Phase 3) | Phoenix, United States | — | Under construction | N2 and A16 (2nm class) | — | — | — | — | Early access | — |
| TSMC Arizona | Arizona Fab (Phase 1) | Phoenix, United States | — | In production | 4nm (4nm class) | 300mm | 2024 | 20 | 22 | Constrained | US CHIPS Act |
| TSMC Arizona | Arizona Fab (Phase 2) | Phoenix, United States | — | Under Constructionnot yet evidenced | 3nm (3nm class) | 300mm | 2027 | — | — | Early access | US CHIPS Act |
| Wolfspeed | Mohawk Valley Fab | Marcy, United States | — | In productionEvidence may be out of date | 200 mm SiC (technology class, no node size published) | 200mm | — | — | — | Available | — |