Acronym · Lithography & Materials
SADP (Self-Aligned Double Patterning)
Halving pitch by depositing a conformal spacer on a patterned mandrel, then removing the mandrel so that the two spacer sidewalls become the etch mask. Pitch is set by deposition thickness, not by overlay.
- Also known as
- Spacer double patterning, SDP
- Type
- Acronym
- Domain
- Lithography & Materials, Patterning techniques
Notes
Produces only continuous loops, so a separate cut or block mask is always required to form real lines.
Related terms
Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
Where it appears on the Hub
Used on 1 page of the Hub. In each group, the pages that mention it most come first.
Suggest an improvement
Suggest an improvement to this entry
A clearer definition, an example, a correction or a source an editor can check. Editors review every suggestion before the entry changes.
Last reviewed: not yet reviewed in depth. Entry last updated . The full glossary