Term · Lithography & Materials
Reticle field
The maximum area a scanner can expose in one shot, conventionally 26 by 33 mm at the wafer. It sets the hard upper bound on monolithic die size, often called the reticle limit.
- Also known as
- Exposure field, Reticle limit
- Type
- Term
- Domain
- Lithography & Materials, Photomasks
Notes
Hitting the roughly 858 mm2 reticle limit is a core commercial argument for chiplet disaggregation.
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