Metric · Lithography & Materials
Overlay
The placement accuracy of a newly printed layer relative to the layers already on the wafer, measured in nanometres at dedicated targets. Overlay error consumes design margin just as surely as critical dimension error.
- Also known as
- Registration, Alignment accuracy
- Type
- Metric
- Domain
- Lithography & Materials, Lithography physics
Notes
Leading-edge scanners now specify on-product overlay well under 2 nm, which multiple patterning schemes consume immediately.
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Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
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