Acronym · Lithography & Materials
PSM (Phase Shift Mask)
A photomask that modulates the phase as well as the amplitude of transmitted light, so destructive interference sharpens the printed edge. It improves resolution and contrast without changing the exposure tool.
- Also known as
- Phase shifting mask
- Type
- Acronym
- Domain
- Lithography & Materials, Photomasks
Notes
Invented by Levenson in 1982 and one of the earliest resolution enhancement techniques adopted in production.
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