Term · Lithography & Materials
Hyper-NA
Informal label for projection optics with numerical aperture above roughly 1.0, reached only with an immersion fluid, and by extension for EUV systems pushed beyond the 0.55 High-NA generation.
- Type
- Term
- Domain
- Lithography & Materials, Exposure tools
Notes
ASML has publicly discussed a Hyper-NA EUV concept above 0.55, but no such tool is in production.
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Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
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