Technology · Lithography & Materials
High-NA EUV (High Numerical Aperture Extreme Ultraviolet)
The 0.55 NA generation of EUV scanners, which resolves roughly 8 nm half-pitch in a single exposure using anamorphic optics and a half-size exposure field. Sold by ASML as the EXE platform.
- Also known as
- 0.55 NA EUV, EXE
- Type
- Technology
- Domain
- Lithography & Materials, EUV lithography
Notes
First systems shipped to leading logic makers from late 2023, with volume insertion expected around the 14 A generation.
Related terms
Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
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