Acronym · Lithography & Materials
EBDW (Electron Beam Direct Write)
Writing patterns straight into resist on the wafer with a focused electron beam, with no mask at all. Resolution is excellent but throughput is orders of magnitude too low for volume production.
- Also known as
- E-beam direct write, EBL
- Type
- Acronym
- Domain
- Lithography & Materials, Patterning techniques
Notes
Used for prototyping, photonics, ASIC personalisation and research, and for writing the masks other tools then use.
Related terms
Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
Where it appears on the Hub
Used on 2 pages of the Hub. In each group, the pages that mention it most come first.
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