Acronym · Lithography & Materials
ArF (Argon Fluoride)
The excimer laser gas mixture that produces 193 nm light, the workhorse wavelength for critical DUV layers in both dry and immersion scanners. Often used as shorthand for the exposure generation itself.
- Also known as
- 193 nm, ArFi (immersion)
- Type
- Acronym
- Domain
- Lithography & Materials, Exposure tools
Notes
The laser gas blend is dominated by neon, which is why neon supply shocks hit lithography directly.
Related terms
Part of the Lithography & Materials glossary, with every term in the topic and the lifecycles, tools and standards that use them.
Where it appears on the Hub
Used on 3 pages of the Hub. In each group, the pages that mention it most come first.
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