Optimized E-Beam Evaporation Reduces Metal-Semiconductor Contact Degradation (RWTH Aachen)

Researchers at RWTH Aachen University published “Mitigating the degradation of metal–semiconductor contacts with optimized electron beam evaporation.” Abstract “An optimized electron beam evaporation (EBE) setup is presented that allows the suppression of charged particle bombardment of 4” semiconductor samples during metal coating. In-situ measurements of charge carrier flux for different tool configurations are carried out.... » read more The post Optimized E-Beam Evaporation Reduces Metal-Se…

Source: Semiconductor Engineering, published 2026-11-11. The summary is the Hub's own; the full story is at the source. Report a rights or accuracy concern