Curvilinear OPC and next-gen photomask optimization

A vector-based approach for semiconductor manufacturing By Sagar Saxena is a Senior Product Engineer at Siemens EDA Curvilinear OPC transforms advanced semiconductor manufacturing Modern semiconductor manufacturing is experiencing a fundamental shift in the way photomasks are created and optimized. As the industry pushes… Read More The post Curvilinear OPC and next-gen photomask optimization appeared first on SemiWiki.

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