Acronym · Lithography & Materials
TMAH (Tetramethylammonium Hydroxide)
The standard aqueous developer for positive-tone photoresist, used at 2.38 percent concentration industry-wide. It dissolves exposed resist while leaving unexposed areas intact.
- Also known as
- 0.26 N developer
- Type
- Acronym
- Domain
- Lithography & Materials, Photoresist
Notes
Highly toxic on skin contact, making TMAH handling a significant fab safety topic.
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