Events / Global directory / International Symposium on Extreme Ultraviolet Lithography

International Symposium on Extreme Ultraviolet Lithography

(EUVL Symposium)

Tier 2: established / regionalSymposium / WorkshopLithography

Usual timing

Normally held in October. No confirmed next-edition date yet.

Organizer: EUV Litho, Inc. / SEMI
Cadence: Annual
Usual host: Rotating, Rotating
Venue: —
Format: In-person
Scale: <500
Audience: EUV ecosystem: scanner, source, mask, resist and metrology suppliers
Website: www.euvlitho.com/

Notes

The annual international EUV lithography symposium that rotates between North America, Europe and Asia and tracks High-NA and source power progress.

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